A look at the research into using metal-organic frameworks as photoresists for cutting-edge silicon etching, as ASML aims to move from EUV to X-ray lithography (Christopher Mims/Wall Street Journal)

Christopher Mims / Wall Street Journal:
A look at the research into using metal-organic frameworks as photoresists for cutting-edge silicon etching, as ASML aims to move from EUV to X-ray lithography  —  We are now one generation of technological alchemy away from the smallest possible silicon microchips

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